Yamamoto, M., Matsumae, T., Kurashima, Y., Takagi, H., Suga, T., Takamatsu, S., . . . Higurashi, E. (2020). Effect of Au Film Thickness and Surface Roughness on Room-Temperature Wafer Bonding and Wafer-Scale Vacuum Sealing by Au-Au Surface Activated Bonding. MDPI AG.
Chicago Style CitationYamamoto, Michitaka, Takashi Matsumae, Yuichi Kurashima, Hideki Takagi, Tadatomo Suga, Seiichi Takamatsu, Toshihiro Itoh, and Eiji Higurashi. Effect of Au Film Thickness and Surface Roughness On Room-Temperature Wafer Bonding and Wafer-Scale Vacuum Sealing By Au-Au Surface Activated Bonding. MDPI AG, 2020.
MLA CitationYamamoto, Michitaka, et al. Effect of Au Film Thickness and Surface Roughness On Room-Temperature Wafer Bonding and Wafer-Scale Vacuum Sealing By Au-Au Surface Activated Bonding. MDPI AG, 2020.