Record Citations
APA (7th ed.) Citation
Bieniek, T., Beck, R. B., Jakubowski, A., & Kudła, A. (2005). Ultra-shallow nitrogen plasma implantation for ultra-thin silicon oxynitride (SiOxNy) layer formation. National Institute of Telecommunications.
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Chicago Style (17th ed.) Citation
Bieniek, Tomasz, Romuald B. Beck, Andrzej Jakubowski, and Andrzej Kudła. Ultra-shallow Nitrogen Plasma Implantation for Ultra-thin Silicon Oxynitride (SiOxNy) Layer Formation. National Institute of Telecommunications, 2005.
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MLA (9th ed.) Citation
Bieniek, Tomasz, et al. Ultra-shallow Nitrogen Plasma Implantation for Ultra-thin Silicon Oxynitride (SiOxNy) Layer Formation. National Institute of Telecommunications, 2005.
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Warning: These citations may not always be 100% accurate.