Strained Si_0.2Ge_0.8/Ge multilayer Stacks Epitaxially Grown on a Low-/high-Temperature Ge Buffer Layer and Selective Wet-Etching of Germanium

von Lu Xie, Huilong Zhu, Yongkui Zhang, Xuezheng Ai, Guilei Wang, Junjie Li, Anyan Du, Zhenzhen Kong, Xiaogen Yin, Chen Li, Liheng Zhao, Yangyang Li, Kunpeng Jia, Ben Li, Henry H. Radamson
Veröffentlicht 2020-08-01