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Ultra-Long-Term Reliable Encapsulation Using an Atomic Layer Deposited HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub>/HfO<sub>2</sub> Triple-Interlayer for Biomedical Implants

Ultra-Long-Term Reliable Encapsulation Using an Atomic Layer Deposited HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub>/HfO<sub>2</sub> Triple-Interlayer for Biomedical Implants

Tekijä Changzheng Li, Maarten Cauwe, Yang Yang, David Schaubroeck, Lothar Mader, Maaike Op de Beeck
Julkaistu 2019-09-01

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