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    Effects of plasma gas interface processing on ferroelectric property of TiN/Hf0.5Zr0.5O2/TiN ferroelectric device Dahkki Wang Zhenhua, Hou Jingwen, Li Zewen, Wang Yuchan, Wang Fang, Zhang Bao, Li QianHui, Xu ChuHeng, Gong Xin, Wang Qi, Han Yemei, Hu Kai, Zhang Kailiang

    Almmustuhtton 2026-02-01
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